Pioneer 180 Laser MBE/PLD System

  • Pioneer 180 Laser MBE/PLD System

  • Schematic of laser MBE/PLD

  • (left ) Ariando et al, Nat. Commun. 2:188 doi:10.1038/ ncomms 1192 (2011). (Pioneer 180 Laser MBE/ PLD System). (right) R. G. Palgrave et al., J. Am. Chem. Soc (2012) 134, 7700-7714. (Pioneer 180 Laser MBE /PLD System)

  • Radiative heater with controller

  • Multi target carousel with software

Pioneer 180 Laser MBE/PLD Systemlaser mbe - setup - thumbnail imagelaser mbe - examples - thumbnail imageRadiative heater and power supplyl and lighted htr thumbnail

Special Features

  • Stand-alone turn-key Laser MBE/PLD System.
  • Deposition of nanoscale thin films using insitu RHEED diagnostics.
  • Deposition of epitaxial films, multilayer heterostructures and Superlattices.
  • Oxygen compatibility for depositions at high pressures and temperatures.
  • Additional deposition sources: Pulsed Electron Deposition (PED), RF/DC Sputtering and DC ion gun.
  • Integration with Laser Substrate Heaters
  • Integration with XPS /ARPES UHV Cluster tools, insitu UHV wafer transfer from PLD system to analytical tools.


UHV-PLD systems integrated with Reflection High-Energy Electron Diffraction (RHEED) diagnostics are also known as Laser MBE systems. These systems are used for creating high-quality epitaxial films and novel interfaces with exceptional film growth-control at the atomic level as has been done conventionally in Molecular Beam Epitaxy (MBE) Systems.

In RHEED, a high energy (20-30 keV) electron beam is incident on the film growth surface at a glancing angle of ~2˚-5˚. The diffraction pattern created on a screen contains information about the crystal structure of the film, stress at the interface, possible impurity phases etc and can be used for real-time monitoring of the film quality. The RHEED oscillations, where the RHEED specular spot intensity is monitored as a function of deposition time provides information on the deposition rate as well as information on the growth mode (2D vs 3D) of the deposited film. A high quality 2D layer-by-layer growth mode is inferred by the observed RHEED intensity oscillations extending to several cycles. Double differential pumping of the RHEED source facilitates high-pressure operation up to about 500mTorr, facilitating real-time moni-toring of complex oxide film growth at high oxygen pressures.

Neocera Laser MBE systems include custom designs such as UHV compatible Laser Substrate Heaters that facilitate integration of Laser MBE systems with insitu Analytical Systems like XPS/ARPES etc. The samples are easily transferred from Laser MBE/ PLD System to XPS/ARPES Systems in UHV.

Substrate Size
10 mm x 10 mm to 2" diameter
Deposition Chamber Size
  • 12” diameter (Pioneer 120 Advanced)
  • 18” diameter (Pioneer 180 Model)
  • Base Vacuum
  • 5 x 10-7 Torr standard
  • 5 x 10-9 Torr upgrade
  • Substrate Heating
    850°C (1000°C as upgrade) Radiative Heater; Oxygen Compatible
    Multi-Target Carousel
    6 x 1" diameter or 3 x 2" diameter
    Mass Flow Controllers
    One MFC for Oxygen is standard, more MFCs available as options
    Windows 7 with Labview 2013
    RHEED Electron Gun and Software
  • Beam voltage: 30keV
  • Operating pressure: 500 mTorr maximum Oxygen pressure.
  • ksA 400 software