Large-Area Pulsed Laser Deposition Systems

  • 8-inch (200 mm) PLD system

  • 4-inch (100 mm) PLD system

  • 6-inch (150 mm) PLD system

  • 6-inch (150mm) PLD System

  • Model of beam scanning assembly

  • Beam scanning control software

PLD System for 4" & 8" Waferslarge area pld - six inch system - thumbnail imagelarge area - UHV PLD System thumbnaillarge area - beam scanning assembly thumbnail imagelarge areas - Thumbnaillarge area - Slide1 thumbnail (2 by 1)large area - Slide2 thumbnail (2 by 1)large area - Slide3 thumbnail (2 by 1)

Special Features

  • Fully automated large-area PLD Systems
  • Wafer sizes: 4”(100 mm), 6” (150mm) and 8” (200 mm) in diameter
  • Deposition of epitaxial films, multilayer heterostructures and Superlattices
  • Oxygen compatibility for oxide film depositions at high temperatures
  • Automated laser beam scanning for thickness uniformity


Neocera Large-area PLD Systems are used to deposit a variety of high quality films on a variety of substrates, up to wafer sizes of 8” (200 mm) in diameter. Substrate rotation, in conjunction with laser beam scanning will provide thickness uniformity over the entire wafer area. The laser beam scanning accessory incorporates a unique Neocera-design that facilitates a fixed laser fluence (J/cm2) on the target as the laser beam is scanned.

The laser beam scanning uses a unique scanning protocol as the laser beam is scanned across the target surface. The dwell time of the laser position on the target follows an inverse velocity protocol facilitating an excellent control of film thickness. The user has a full control of altering the scanning parameters which is needed as the thickness profiles depend on the deposition pressure.

Substrate Sizes
  • 4" (100 mm)
  • 6" (150 mm)
  • 8" (200 mm)
  • Deposition Chamber Size
    18” diameter in diameter
    Base Vacuum
  • 5 x 10-7 Torr Standard
  • 5 x 10-9 Torr (UHV Upgrade)
  • Substrate Temperature
  • 850 °C (4")
  • 750 °C (6")
  • 700 °C (8") Oxygen compatible
  • Thickness Uniformity
    ±5% or better with laser beam scanning
    Multi-target Carousel
    4 x 2" Diameter
    Substrate Load-locks
    Mass Flow Controllers
    One MFC for Oxygen is standard, more MFCs are optional
    Windows 7, LabView 2013
    3 RF/DC Sputter sources/DC ion sources